Researchers create 1-step graphene patterning method

Researchers from the University of Illinois at Urbana-Champaign have developed a one-step, facile method to pattern graphene by using stencil mask and oxygen plasma reactive-ion etching, and subsequent polymer-free direct transfer to flexible substrates.

 

Graphene, a two-dimensional carbon allotrope, has received immense scientific and technological interest. Combining exceptional mechanical properties, superior carrier mobility, high thermal conductivity, hydrophobicity, and potentially low manufacturing cost, graphene provides a superior base material for next generation bioelectrical, electromechanical, optoelectronic, and thermal management applications.

 

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